纯化器设备介绍

纯化器设备介绍厂务处气化部纯化(PURIFYING)是什么??气体的纯度是5N(99.999%)99.999%=杂质浓度是

百万之十(10ppm)气体的纯度是8N以上(≥99.999999%)99.999999%=杂质浓度是

十乙之十(10ppb)纯化器H2OO2N2CH4CO2COH2OO2N2CH4CO2COH2OO2CH4CON2CO2H2OO2CH4COCO2纯化以前纯化以后纯化办法吸附物(Absorber)催化剂(Catalyst)Getter纯化办法MS(MolecularSieve)=Absorber[吸附物

]MS能去掉CO2,H2O(不必加热)

MS+H2O,CO2→MS-H2O,MS-CO2MS要再生课程

(在加热),所以不必更换MS-H2O,MS-CO2→MS,H2O,CO2Ni,Pd=CatalystNi能去掉CO,O2(不必加热)/Pd能去掉CH4(在加热)

Ni+CO,O2

→Ni-CO,Ni-O2/Pd+CH4→Pd+CO2,H2ONi要再生课程

(在加热,H2),Pd没有再生

Ni-CO,Ni-O2→Ni,CO2,H2OGetter=ZrAlloy(Zr合金)Zr能去掉所有杂质:Zr+CO,O2,H2O,CO2,H2,N2…Zr没有再生课程*平常兼用两个办法

吸附物

+催化剂,吸附物+GetterH2OM/S:MolecularSieve

吸附物质加热※加热效果供给能量为扩大POREGATE和活化分子运动吸附物纯化和再生原理纯化再生H2O200–300℃CO2CO2Getter(Zr)纯化图式ZrZrZrZrZrH2OZrZrZrZrZrH2OZrZrZrZrZr※加热效果

便于Zr的化学吸附便于杂质向Zr

内扩散(不可逆反应)化学吸附物理吸附内部

扩散300–400℃HeaterOperationMethod[加热办法模式]PLCMCCBMCELBCPSSRHeaterRelayTempControllerMCCB:MoldedCaseCircuitBreakerELB:ElectricLeakageBreakerMC:MagneticContactCP:CircuitProtectorSSR:SolidStateRelayPLC:ProgrammableLogicControllerAlwaysOn常开AlwaysOn常开AlwaysOn常开NormallyOffReceivedSignal常闭收到信号开NormallyOffReceivedSignal常闭收到信号开PLCSignal从PLC

信号

Temp.ControllerSignal从T/C信号PowerSupplyLine电共给AlwaysSignalOn常开信号PLCSignal→On有信号开AlarmListDescriptionHighTemperatureAlarm[最高温度警告]HighPressureAlarm[最高压力警告]EMO[EmergencyButton]SSRFailAlarm[继电器故障警告]MCFailAlarm[继电器故障警告]CPFailAlarm[短路器故障警告]ELBFailAlarmAirFailAlarm[CDA共给压力不够警告]ShutDownAlarmWarningAlarmAllValveClose[开的气动发闭]

AllHeaterOff[加热的电炉闭

GasSupplyStop[气体是停]GasSupplyContinue[不影响气体共給]LeakDetector2NDAlarmElectricPartMatchwithHeaterN2PurifierMCCBELB1ELB2ELB3MC1MC2MC3MC4MC5CP1CP2CP3CP4CP5CP6CP7SSR1SSR2SSR3SSR4SSR5SSR6SSR7Heater1Heater2Heater3Heater4Heater5Heater6Heater7AColumnBColumnC_CatalystElectricPartMatchwithHeaterH2PurifierMCCBELB1ELB2ELB3MC1MC2MC3MC4MC5CP1CP2CP3CP4CP5SSR1SSR2SCR1SCR2SCR3Heater1Heater2Heater3Heater4Heater5MC6CP6SCR4Heater6ELB3AColumnGetter-1BColumnGetter-2ElectricPartMatchwithHeaterO2PurifierMCCBELB1ELB2ELB3MC1MC2MC3MC4CP1CP2CP3CP4SSR1SSR2SCR1SCR2Heater1Heater2Heater3Heater4AColumnBColumnC_CatalystPurifierUNITHT1HT2HT3HT4HT5HT6HT7OUTLETPCWDPS1DPS2DPS3FM1FM2FM3MFCCQCFM℃PSINm3/hrlpmlpmsccmlpmN2SET250250250250350350350------40052.01.5HIGH350350350350450450450605015015015050050035.03.0LOW40404040505050--151515-350102.01.0H2SET250250300300300300N/A-----N/A60N/AN/A1.5HIGH3503504004004004006050150150150803.0LOW404050505050--151515501.0O2SET250250350350N/AN/AN/A----N/AN/A40N/AN/AN/AHIGH350350450450605015015050LOW40405050--151530*ThetemperatureofpurifyingMScolumnshouldbecontrolledbelow50℃*PressureofArcylinderintheH2purifierroomshouldbecontrolledover10kg/cm2ParameterSetting■PurifierSettingTheKeyofGeneralManagement■DailyCheck-RecordeachparametersuchasTemperature,Pressure,Flowrateeveryday-Compareparameterwithsetting■PCWTemperatureandFlowrateN2Purifier-RelationwithTemperatureofMolecularSievewhichshouldbecontrolledbelow50℃H2Purifier-RelationwithTemperatureofOutlet(SupplyingintoFab.)line■ImpurityofSourceGas-GN2&GH2shouldbeabove5N,GO2shouldbeabove3N-InfluenceonTemperatureofMolecularSievePurifyingwhichshouldbecontrolledbelow50℃-AbnormalimpurityshortenlifetimeofGetterColumn(H2Purifier)-DuringexchangingH2gascylinder,keepairfromenteringintopurifier■EnvironmentofPurifierRoom-TemperatureandHumidity,Particlecouldhaveaninfluenceonpartlifetime■GeneralManagement-DonotShutdownotherwiseeme