核-壳结构PS C eO 2复合磨料的制备及其氧化物化学机械抛光性能_第1页
核-壳结构PS C eO 2复合磨料的制备及其氧化物化学机械抛光性能_第2页
核-壳结构PS C eO 2复合磨料的制备及其氧化物化学机械抛光性能_第3页
核-壳结构PS C eO 2复合磨料的制备及其氧化物化学机械抛光性能_第4页
核-壳结构PS C eO 2复合磨料的制备及其氧化物化学机械抛光性能_第5页
免费预览已结束,剩余2页可下载查看

下载本文档

版权说明:本文档由用户提供并上传,收益归属内容提供方,若内容存在侵权,请进行举报或认领

文档简介

核-壳结构PSCeO2复合磨料的制备及其氧化物化学机械抛光性能摘要:本文采用一种简单的溶胶-凝胶方法制备了核-壳结构的PSCeO2复合磨料,通过SEM、XRD、FTIR等手段对其结构和性能进行了表征。研究结果表明,所制备的复合磨料具有明显的核-壳结构,CeO2与PS颗粒加强相互作用,CeO2的表面包覆了一层聚合物壳,使得复合磨料的密度增大,稳定性提高,摩擦磨损性能也得到了显著的提升。氧化物化学机械抛光实验表明,经过优化制备条件的核-壳结构PSCeO2复合磨料具有良好的抛光效果,对硅片表面的微观不平整度和表面光洁度有明显的提升,可以应用于半导体、光学和微电子等领域。

关键词:核-壳结构;PSCeO2复合磨料;氧化物化学机械抛光;半导体;光学;微电子

Introduction:

Withtherapiddevelopmentofthesemiconductor,opticalandmicroelectronicsindustries,thedemandforhigh-precisionpolishingtechnologyhasbecomeincreasinglyurgent.Amongthem,oxidechemicalmechanicalpolishing(CMP)technologyhasbecomeawidelyusedprocessingmethodduetoitsadvantagesoflowdamage,highefficiencyandhighstability.Thequalityofthepolishingprocessdependsnotonlyonthepolishingslurry,butalsoontheabrasiveparticlesusedintheslurry.

Inrecentyears,researchershavedevelopedcore-shellstructurecompositeabrasivestoimprovethepolishingpropertiesoftheabrasive.Duetotheuniquecore-shellstructure,thecompositeabrasivehasbetterstability,surfaceactivityandcompatibilitywiththematrix,whichprovidesanewapproachforimprovingthepolishingperformanceoftheabrasive.

Theaimofthepresentstudyistoprepareacore-shellstructuredPSCeO2compositeabrasivebysol-gelmethodandinvestigateitsoxidechemicalmechanicalpolishingperformance.

ExperimentalSection:

ThePSCeO2compositeabrasivewassynthesizedbyasol-gelmethod.Polystyrene(PS)microsphereswereusedasthecore,andceriumoxide(CeO2)nanoparticleswereusedastheshell.ThePSmicrosphereswerefirstmodifiedbysurfaceoxidationwithpotassiumpermanganateandthendispersedindeionizedwaterbyultrasonictreatment.TheCeO2nanoparticlesweredispersedinethanolbyultrasonictreatmentandthenmixedwithasuitableamountofsilanecouplingagentAPTES.ThemixedsolutionwasslowlydroppedintothePSmicrospheredispersionunderstirring,andthesystemwasstirredfor24htoobtainthePSCeO2compositeabrasive.

TheobtainedcompositeabrasivewascharacterizedbySEM,XRDandFTIR.TheoxidechemicalmechanicalpolishingexperimentswerecarriedoutonaBuehlerpolishingmachineusingaSiwaferasthesubstrate.Thepolishingparameterswereoptimized,andthepolishingperformancewasevaluatedbysurfaceroughness,surfacetopography,andremovalrate.

ResultsandDiscussion:

TheSEMimagesofthePSCeO2compositeabrasiverevealedthecore-shellstructureofthecompositeparticles.TheCeO2nanoparticlesweredistributedonthesurfaceofthePSmicrospheresandformedauniformshelllayer,increasingtheparticlesizeandstabilizingtheparticles.TheXRDandFTIRspectraindicatedthepresenceofCeO2andPSinthecompositeabrasive,andthePSCeO2compositeabrasivehadbettercompatibilityandstability.

TheoxidechemicalmechanicalpolishingexperimentsshowedthatthePSCeO2compositeabrasivehadbetterpolishingperformancethanpureCeO2abrasive.Undertheoptimalconditions,thesurfaceroughnessandsurfacetopographyoftheSiwaferweresignificantlyimproved,andtheremovalratewasalsogreatlyincreased.

Conclusion:

Acore-shellstructuredPSCeO2compositeabrasivewassuccessfullysynthesizedbysol-gelmethod.Thecompositeabrasivehasbetterstability,compatibilityandpolishingperformancethanpureCeO2abrasive.ThePSCeO2compositeabrasivehasgreatpotentialforapplicationinthefieldsofsemiconductor,opticalandmicroelectronics.Inconclusion,thesynthesisofcore-shellstructuredPSCeO2compositeabrasivesbysol-gelmethodoffersapromisingapproachforimprovingthepolishingperformanceofabrasiveparticles.TheobtainedcompositeabrasiveshavebetterstabilityandcompatibilitywiththematrixcomparedtopureCeO2abrasive,andthecompositeparticlesshowasignificantimprovementinpolishingperformance.ThePSCeO2compositeabrasivehasgreatpotentialforapplicationinthesemiconductor,opticalandmicroelectronicsindustriesduetoitsgoodpolishingproperties.Furthermore,thesol-gelmethodusedtosynthesizethecompositesisasimpleandeffectivemethodthatcanbeeasilyscaledupforindustrialproduction.Futureresearchcanfocusontheoptimizationofthecompositeabrasivepropertiesbyadjustingthecompositionandstructureoftheparticles.Overall,thisstudyprovidesnewinsightsintothedevelopmentofhigh-performanceabrasivesfortheoxidechemicalmechanicalpolishingprocess.Furthermore,thecore-shellstructureofthePSCeO2compositeabrasivescanbefurtheroptimizedbycontrollingthethicknessanddensityoftheshelllayer.Theshellthicknessanddensitycansignificantlyaffectthepolishingperformanceoftheparticles,astheycaninfluencethecontactareabetweentheabrasiveandthesubstratesurfaceduringpolishing.Therefore,moreresearchcanbeconductedtoinvestigatetheeffectofshellthicknessanddensityonthepolishingpropertiesofthecompositeabrasives.

Inadditiontothecore-shellstructure,theparticlesizeofthecompositeabrasivesalsoplaysanimportantroleindeterminingtheirpolishingperformance.Smallerparticlesizeusuallyleadstobettersurfacequalityandhigherpolishingefficiency.Therefore,thesol-gelmethodcanalsobeusedtocontroltheparticlesizeofthecompositeabrasives,whichcanfurtherenhancetheirpolishingproperties.

Furthermore,thePSCeO2compositeabrasivescanalsobemodifiedwithdifferentfunctionalgroupstoimprovetheirchemicalandphysicalproperties.Forinstance,theadditionofhydrophobicfunctionalgroupscanenhancethedispersibilityandstabilityofthecompositeparticlesinthepolishingslurry,whichcanimprovethepolishinguniformityandreducethedefectdensityonthepolishedsurface.

Overall,thedevelopmentofPSCeO2compositeabrasivesbysol-gelmethodholdsgreatpotentialforimprovingthepolishingperformanceofabrasiveparticlesintheoxidechemicalmechanicalpolishingprocess.Futureresearchinthisareacanfocusonoptimizingthestructure,particlesize,andsurfacemodificationofthecompositeabrasivestofurtherimprovetheirpolishingpropertiesandexpandtheirapplications.Anotheraspectoffutureresearchcanfocusoninvestigatingtheinteractionsbetweenthecompositeabrasivesandthepolishingpad,asthiscangreatlyaffectthepolishingperformanceandsurfacequalityofthepolishedsubstrate.Thesurfacepropertiesofthepolishingpad,suchasitssurfaceroughnessandporosity,caninfluencethefrictionalforcebetweentheabrasiveparticlesandthesubstrate,whichcanaffectthepolishingrateanduniformity.Therefore,thedevelopmentofasuitablepolishingpadforusewithPSCeO2compositeabrasivescanbeexploredtooptimizethepolishingprocess.

Moreover,thesol-gelmethodcanbeextendedtothesynthesisofothercompositeabrasives,suchasPSTiO2,PSAl2O3,andPSSiO2,toexpandtherangeofmaterialsthatcanbeusedinthechemicalmechanicalpolishingprocess.Inaddition,compositeabrasiveswithdifferentshapes,suchasrodsorfibers,canalsobesynthesizedusingsol-gelmethod,whichcanprovidenewstrategiesforpolishingcomplexsurfacesorstructures.

Lastly,theeffectofenvironmentalfactorssuchastemperatureandpHontherheologicalpropertiesandstabilityofthepolishingslurrycontainingthecompositeabrasivescanbeinvestigatedtodevelopmorestableandefficientpolishingslurries.Thiscanhelptoreducetheprocessingtimeforpolishingandimprovethecost-effectivenessoftheprocess.

Inconclusion,thesol-gelmethodhasbeenshowntobeapromisingapproachforthesynthesisofPSCeO2compositeabrasiveswithsuperiorpolishingperformance.Theextentofitsapplicationcanbeexpandedbyfurtheroptimizingtheparticlestructure,size,andsurfacemodification,aswellasexploringtheuseofothercompositeabrasivesandpolishingpads.Thechemicalmechanicalpolishingprocesscanthusbefurtherenhancedbyutilizingtheseinnovativeapproaches.Anotherareaforfutureresearchinthefieldofsol-gelsynthesizedcompositeabrasivesisexaminingtheiruseindifferentindustries,suchasintheoptical,semiconductor,andbiomedicalindustries.TheabilityofPSCeO2compositeabrasivestoachievehigh-qualitypolishingwithminimalsurfacedamagemakesthempotentialcandidatesforpolishingopticallensesandsemiconductordevices.

Furthermore,thebiocompatibilityandlowcytotoxicityofceriumoxidemakePSCeO2compositeabrasivesapromisingmaterialforbiomedicalapplications,suchaspolishingd

温馨提示

  • 1. 本站所有资源如无特殊说明,都需要本地电脑安装OFFICE2007和PDF阅读器。图纸软件为CAD,CAXA,PROE,UG,SolidWorks等.压缩文件请下载最新的WinRAR软件解压。
  • 2. 本站的文档不包含任何第三方提供的附件图纸等,如果需要附件,请联系上传者。文件的所有权益归上传用户所有。
  • 3. 本站RAR压缩包中若带图纸,网页内容里面会有图纸预览,若没有图纸预览就没有图纸。
  • 4. 未经权益所有人同意不得将文件中的内容挪作商业或盈利用途。
  • 5. 人人文库网仅提供信息存储空间,仅对用户上传内容的表现方式做保护处理,对用户上传分享的文档内容本身不做任何修改或编辑,并不能对任何下载内容负责。
  • 6. 下载文件中如有侵权或不适当内容,请与我们联系,我们立即纠正。
  • 7. 本站不保证下载资源的准确性、安全性和完整性, 同时也不承担用户因使用这些下载资源对自己和他人造成任何形式的伤害或损失。

评论

0/150

提交评论