HULLTEST赫尔槽测试中文版

1、2 (5.4The Hull Cell (U.S. Patent # 2,149,344) is a miniature test cell designed to produce a plated deposit over a range of current densities. The deposit is dependent upon the condition of the plating bath (i.e. concentration of primary components, additionagents and impurities). TheHull Cellis a u

2、seful tool for varying chemical composition,determining covering power (the lowest current density at which a deposit isproduced), measuringaverage cathode efficiency, average metal distribution or throwing power, andobserving the effects of pH,temperature and decomposition products. A clear LuciteH

3、ull Cellenables theoperator to observe the plating onthe back of the test panel to determine relative covering power at very low current densities.赫尔槽（美国专利 2149344 ）是一种被设计用来在一定电流密度范围内产生电镀层的小型测试槽。电镀层的状况由电镀液的状况决定（主盐成分 ，添加剂和杂质）。赫尔 Cell 是一种有用的工具，为不同的化学组成，确定覆盖能力（最低电流密度产生的镀层），测量平均电流效率， 金属平均分配或分散能力， 并观察 pH

4、 值温度和分解产物的影响， 。一个透明的合成树脂赫尔槽能够让操作者通过观察试片背面的镀层，以确定在非常低的电流密度下的相对覆盖能力。The Hull Cel l was originally developed by the R. O. Hull Company, which later became the ROHCO Division ofMcGean-Rohco, and is now part of Atotech. The Hull Cell has become an integral part of plating operations everywhere.赫尔槽最早由赫尔公司

5、发明，该公司现在是安美特公司的一个部分，赫尔槽已经成为世界各地电镀操作的一个必须部分。ADVANTAGESThe Hull Cell enables an experienced operator to determine the following facts abouta plating solution:1. Approximate Bright Current Density Range. This is accomplished by comparingthe bright plated areas on the panel with current densities given

6、in a chart. If the brightor operable range is between 1-1/4 ” (3.2 cm) and 2- 1/2“ (6.4 cm) from the left side ofthe panel, and the total current applied is 3 Amps,the corresponding respectivecurrent densities from a Hull Cell ruler or chart lie between 75 Amps/ft2(7.6 Amps/dm 2) and 25 Amps/ft2 (2.

7、7 amps/dm2). Since these values representextreme limits, it doesnot follow that either of these current densities can be used in a plating bath without obtaining a poordeposit. However, some intermediate current density such as 50 Amps/ft Amps/dm 2 ) should workbest.优点：赫尔槽可以让有经验的操作者确定电镀液的以下状况：1. 近似光

8、亮电流密度的范围。这是通过用给定的电流密度下比较在试片上的光亮镀层范围来实现。如果光亮或可操作的范围为从试片的左边算起1- 1/4 “（ 3.2 厘米）和 2- 1/2 ”（ 6.4 厘米），提供的 总电流为 3 安培，从各自的相应赫尔槽尺或图表电流密度读出电镀范围为 75 Amps/ft2（ 7.6 Amps/dm2 ）和 25 Amps/ft2 （2.7 amps/dm2 ）。由于这些值代表了极限，但是这不表示这些电流密度可以在任一镀液中使用而不产生差的镀层。所以，一些中间电流密度，如50 Amps/ft2 （5.4 Amps/dm2 ）是最合适的。2. Approximate Conce

9、ntrations of Primary Constituentssuch as zinc metalcontent, sodium cyanidecontent, nickel metal content, etc. Generally, the higher the metal content of a bath, the higher (but notnecessarily wider) is the operable bright current density range.3. Addition Agent Concentration . Although a few additio

10、n agents can be determined by analysis, theHull Cell test usually provides the only satisfactory means of controlling the addition of these materials,provided they exhibit a visible effect on the deposit.4. Metallic or Organic Impuritiesin a plating bath affect the appearance of the HullCell deposit

11、, andtheir presence or absence can be established.2. 主要成分的大概浓度。 如锌金属含量，氰化钠，镍金属含量等，一般来说镀液的金属含量越高可操作的光亮电流密度越高。 （但不一定是更宽的）3. 添加剂用量。虽然有少数添加剂可以分析，赫尔槽试验通常提供了控制这些添加剂唯一令人满意的方法，只要添加剂在镀层上产生可见的效果。4. 镀液中的金属或有机杂质会影响试片的外观，因此可以判断这些杂质是否存在。TEST METHODSBefore running a Hull Cell plating test, the following steps must

12、 be taken:1. Bring the solution to be tested to its normal operating level in the plating tank.2. Either stir the bath thoroughly or use a sampling tube extending to the bottom of the tank and go overthe tank uniformly from one end to the other.3. The temperature of the bath sample should be maintai

13、ned at the proper operatingtemperature duringthe test. The best method for testing samples at high temperatures is by using a Model HT Hull Cell,which is equipped with a heating element and thermostat.4. Use a clean Hull Cell and clean the cathode panel. If more than one type of plating solution is

14、to betested regularly, one cell should be used exclusively for each type to avoid cross contamination.5. Hull Cell plating tests do not eliminate the need for occasional chemical analysis. Such analyses shouldbe made before the plating test so that the bath sample can be adjusted to the optimum comp

15、ositioneither prior to or during the sequence of Hull Cell tests.分析方法在进行赫尔槽测试前，以下的步骤必修遵循1 使要进行测试的镀液操作条件和镀槽里的一样。2 要么彻底搅拌镀液或使用采样管延伸到镀槽底部从镀槽的一边转到另一边。3. 在测试时测试镀液的温度必修保持在一定的操作范围，一些要在较高温度下测试的镀液，最好采用可加热和控温的赫尔槽4 使用清洁的赫尔槽和试片。赫尔槽最好专用，避免不同镀液的交叉污染。5 赫尔槽测试不能取消代替必要的化学分析，在赫尔槽测试前应分析样品，以便镀液可以在赫尔槽测试时调整到最佳的范围。6. Zinc

16、coated steel cathode panels must be stripped of the zinc by immersing them into a 1:1 solution ofhydrochloric acid and water, rinsed and then cleaned with a wet, clean cloth or wet paper towel, justbefore use. Since the Hull Cell is an actual plating tank, improperly prepared panels will not respond

17、satisfactorily in the cell, just as in commercial practice.7. For duplication of results, plating times in the Hull Cell should be the same as that used in theproduction tank. Testing times for different solutions may differ and are specified in the section thatfollows for the different solutions. A

18、 conventional timer can be supplied as anaccessory to the Hull Cellset.8. The correct volumes of solution to use is 267 ml for the 267 ml Hull Cell, 534 ml for the 534 ml Hull Celland 1000 ml for the 1000 ml Hull Cell. A 2-gram addition to 267 ml, 4-gram addition tothe 534 ml or7.5-gram addition to

19、a 1000 ml Hull Cell is equivalent to a 1 oz/gal (7.5 g/l) addition to the plating tank.To test a hot bath sample, the Model HT Hull Cell should be used. NOTE: A Lucite Hull Cell shouldnever be placed on a hot plate.9. CAUTION: DO NOT LEAVE THE HEATER ON OVERNIGHT OR UNATTENDED FOR PROLONGEDPERIODS O

20、F TIME. EVAPORATION OF THE SOLUTION COULD CAUSE A MELT DOWN OF THEHULL CELL ITSELF - A POTENTIAL FIRE HAZARD.10. The Filtered Output Rectifier Model B-267 or Model B-534 is the preferred current source. A singlephaserectifier without a properly designed filter circuit must not be used.11. Steel cath

21、odes have a semi-bright, uniform appearance. Cathodes should only be used once and thenfiled for future reference. They should not be stripped and reused, as this will change the condition ofthe surface. Experience has shown that a poor or non-uniform steel surface can cause misleadingresults. Repla

22、cement cathodes that duplicate the original zinc plated cathode panels provided with theset may be ordered from Atotech. Polished brass panels are also available for use with copper, nickeland chromium plating solutions.12. Do not make too many tests on one sample of plating bath. Generally, six pan

23、elscannot be made on asingle nickel-plating bath sample unless the pH is checked after each second panel.Here the HT 534cell is desirable because of the high volume-low current ratio.6.有锌层的钢试片在使用前必须用1:1 的盐酸水溶液退掉锌层，然后用湿的纸巾或布清洁，由于赫尔槽就是一个实际上的镀槽，没有经过认真处理清洁的试片就不能确定满意的效果，就像实际电镀中那样。7 为了实验结果的可复制性，赫尔槽的测试时间应和

24、实际的电镀时间一致，不同镀液的测试时间可能不同，可通过一个计时器来控制时间。8. 使用正确体积的镀液来测试， 如 267ml 在 267ml 规格的赫尔槽里。测试热的镀液可以用可加热的赫尔槽，但是应注意透明树脂的赫尔槽不能用来测试热的镀液。9 注意：使用加热的赫尔槽时应有人看守，避免镀液蒸发完产生火灾危险。10 使用具有良好滤波能力的整流器。11. 试片有半光亮均匀的外观， 试片只能用一次， 然后保存起来以供日后参考，试片不能退镀和重复使用，因为这将改变试片表面的状况，经验表明一个表面很差的或者不均匀的试片可能会导致实验结果的误判，安美特可提供覆锌的钢板试片，抛光的黄铜片也可用于铜镍铬镀液的测

25、试。12 同一个镀液样品不能做太多次的测试，一般来说一个镍的样品最多打六张片，而且每打一张都要检测溶液的PH 值。如果是 534ML 的槽则可以在低电流打片的时候多打几张。13 单位换算克/升=0.134 盎司 /加仑克/升=0.1 千克 /百升SPECIFIC PLATING BATHSThe Hull Cell plating test is best used to determine the effects of varying each type of plating bath used inproduction. For example, if a bright nickel ba

26、th is to be tested, each parameter (e.g.temperature, agitation,nickel, sulfate, chloride, brightening agents and metallic impurities such as copper, lead, zinc, etc.) should beevaluated individually and the effects noted on the deposit. In conducting such tests, itis helpful to make updilute solutio

27、ns of the proprietary addition agents so that unit volumes added to the Hull Cell volume are equivalent to simple additions to the plating bath.具体的各种镀液测试赫尔槽电镀测试是最好的用来确定每个不同镀液生产中各种因素的影响 ，例如，如果一个光亮镍镀液进行测试， 每个参数（如温度，搅拌，镍，硫酸盐，氯化物，光亮剂和金属杂质如铜，铅，锌等）应独立的考虑并且在镀层上表示出来。在进行这种试验，稀释专门的添加剂很有用，以便计算添加入镀槽中的量。For soli

28、d chemicals, the addition of 2 grams to 267 ml, 4 grams to 534 ml, and 7.5 grams to 1000 ml Hull Cellsis equivalent to 1 oz/gal (7.5 g/l) to the plating tank. Liquid chemicals such as brighteners or addition agents arenormally specified or controlled based on percent (%) by vol. (ml/l) or fl.oz/gal.

29、对固体化学品，添加 2 克至 267 毫升， 4 克至 534 毫升， 7.5 克到 1000 毫升赫尔槽相当于添加 1 盎司 /加仑（ 7.5 克 /升）至电镀槽。对光亮剂或补充剂等液体化学品通常通过毫升 /升或 fl.oz / 加仑指定或控制的体积百分比。When the additive is a liquid, a solution diluted with water is recommended for Hull Cell additions and testing.The material should be diluted to a 20% by volume solution

30、. The addition of one (1.0)ml of a 20% by volumesolution to a 267 ml Hull Cell is equivalent to an addition of 0.075% by vol. (0.75 ml/l),0.1 fl. oz./gal, of theadditive to the plating tank.当添加剂是液体时最好将添加剂稀释成 20% 的水溶液，添加 1ml 到 267ml 的赫尔槽里相当于添加 0.75ml/l 的这种添加剂到镀槽里。The value of the Hull Cell test depen

31、ds upon the experience that the operator has gained in using it. Thefollowing generalizations serve as a guide as to what can be expected when testing different types of baths.赫尔槽测试的价值取决于操作者的经验，以下概括为一个测试不同镀液的指导。BRIGHT NICKELBright nickel baths are probably the most difficult to control when trying t

32、o maintain deposit luster. Somebrightening agents can be determined by analysis, in which case, Hull Cell tests serve as a check on theoperating condition of the bath. Other brightening agents cannot be checked analytically. In this case, the HullCell becomes a useful tool for controlling concentrat

33、ion. Testing of bright nickel solutions requires a uniformquality steel cathode panel in order to check the ability of the bath to build brightness.光亮镀镍光亮镍镀液可能是最难以控制的镀液， 因为要保持镀层光亮。 一些光亮剂可以通过分析确定， 在这种情况下， 赫尔槽测试提供了一个对镀液使用状况的检查， 其他添加剂不能分析，在这种情况下，赫尔 槽 成为一种控制浓度的有用工具。光亮镍镀液的测试需要一个均匀的优质试片，以检查镀液的光亮能力。Before

34、running a Hull Cell test, the bath should be analyzed for nickel, sulfate, chloride, boric acid and pH.在进行测试前， 应分析镀液的镍，硫酸盐，氯化物，硼酸和pH 值。Generally, the current used for the 267 ml or 534 ml Hull Cell is 3 amperes and for the 1,000 ml unit, 5amperes. For low current density problems, a one-ampere panel

35、 is recommended.The plating time should be5 minutes.一般来说，电流密度为的267 毫升的赫尔槽或534 毫升赫尔槽3安培，为 1000 毫升的 5 安培，关于低电流密度的问题，建议1 安培， 5 分钟。The plating tests should be run on the bath as sampled and then after the salts and pH have been adjusted.Additional Hull Cell tests should then be made to determine the eff

36、ects of impuritiesand brighteneradjustments.测试应在主盐和 PH 值调整后进行，然后再确定添加剂和杂质的影响。 Solution agitation, if used, is provided by regular movement of a glass-stirring rod parallel to the face of thecathode. This can be done either manually or mechanically using the Atotech Hull Cell Agitator. Air agitationc

37、an also be provided by use of the Model HT Hull Cell with a built in air line. Hull Cell tests may not alwaysindicate the slight pitting tendencies of baths.镀液搅拌，如果使用，是由一个玻璃搅拌棒平行于试片表面反复运动这可以手动或机械使用阿托赫尔槽搅拌。空气搅拌， 也可用空气泵提供，赫尔槽试验不一定表明了镀液的轻微针孔倾向。The temperature should be maintained at the same level as t

38、hat of the production bath. The Model HT Hull Cellshould be used for testing heated baths.镀液温度应该和生产镀液的温度一致，可使用带加热装置的赫尔槽。The maximumnumber of tests that can be run on one sample is three (five in the 534 ml Hull Cell),unless thepH is checked and adjusted.一个样最多打三张片，除非镀液的PH 值检查调整过。Interpretation - Brig

39、ht Nickel解释光亮镍Interpretation - Bright NickelOptimum Composition - Brilliant, uniform, non-pitted deposits from 5-125 Amps/ft2(0.5-12.5 Amp/dm 2).High pH - Yellow tinge to deposit, may be irregular and brittle at high currentdensities.Low pH - Gassing at cathode, smoky-blue or brittle deposit.Low Nic

40、kel - Burned high current densities area.Low Boric Acid - Checked deposit at high current density, nickel hydroxideprecipitated on cathode panel or atendency toward pitting.Low Chloride - Gassing at the anode, low anode efficiency, higher than normalvoltage.High Anti-pit Agent- Smoky, irregular depo

41、sit.Low Anti-pit Agent- Pitting of the deposit, particularly noticeable at high currentdensities. To check, bend thelower 1/4" (6 cm) edge of the panel to be horizontal and repeat the test. Examine thehorizontal edge for pits ifboric acid concentration is normal.High "Primary" or &quo

42、t;Carrier" Brightener - Usually there is no upper limit to thisbrightener content, exceptsolubility.Low "Primary" or "Carrier" Brightener - Dull, non-uniform brittle deposit, usually athigher current densities,poor chrome receptivity.High "Booster" or "Seconda

43、ry" Brightener - -Low "Secondary" Brightener - Semi-bright deposit exhibiting poor leveling.Organic Contamination - Brittle, hazy deposit usually over the entire plating range,peeling at high currentdensity, dull low current density range.Dissolved Air or Oil in Bath - Pits or orange-

44、peel deposit; splotches that representthin areas.High Bath Temperature - A dull or hazy deposit.Low Bath Temperature - A dull or burned deposit at high current density.最优组合：在 0.5-12.5 ASD范围内 光亮，均匀，无针孔高 PH: 镀层发黄，高区异常或脆性大低 PH: 阴极产生气体，镀层发雾发蓝，脆性大。镍含量低：高区烧焦。硼酸低 检查高电流区，氢氧化镍沉淀于镀层或产生针孔。低氯- 在阳极放气，低阳极效率，高于正常电

45、压。高湿润剂 发雾，非正常镀层。低湿润剂 -针孔，在试片六厘米处弯曲测试，如果硼酸含量是正常的在试片边缘检查是否有针孔。柔软剂或初级光亮剂过多-不考虑溶解度外通常无上限。柔软剂或初级光亮剂不足 -不光亮，不均匀脆性镀层， 套铬困难。（高电流区较明显）光亮剂或次级光亮剂过多-脆性镀层，低区黑色沉积，套铬困难。次级光亮剂过少-半光亮度层。有机污染 -脆性大，整个试片发朦，低区无光亮。镀液中有气泡或油-针孔或橘皮状镀层。高温 -不光亮，发朦。低温 -不光亮，高区烧。杂质影响Shown by dark deposits at low current densities.Copper or Zinc -

46、 See "Electrolytic Purification".Chromium - Black at high current densities, skip plating in low current densities.Iron - Slight burning at high current densities, roughness.低区出现灰黑的镀层铜或锌 -铬- 高区发黑，低区断层。铁- 高区轻微烧，镀层粗糙。ROCHELLE COPPER CYANIDEUnder optimum conditions, the Rochelle Copper Cyanid

47、e bath produces deposits that are smooth and semibrightin appearance. The bath serves two purposes - one, to produce a flash coating in which variations inbath composition may be tolerated; and second, to build thicknesses up to 0.4 mils(10 microns), where bathcomposition is more critical.A current

48、of two amperes for 5 minutes should be used at a temperature that corresponds to that of the platingsolution. Steel cathodes are recommended. The anode should be made of pure copper; phosphorized coppershould not be used. The best means of heating solutions is in a Model HT Hull Cell.碱铜在最佳条件下，诺切液氰化铜

49、镀液产生平滑和半光亮的镀层，镀液有两个目的：1 产生一个闪镀层， 这种用途镀液成分的变化可以较大的容忍度2.加厚镀层， 这时镀液的成分很关键，建议2 安培五分钟，适当加温，采用钢试片，纯铜阳极，不能用磷铜，最好采用可加温的赫尔槽。InterpretationOptimum Composition for a Still Solution - Smooth, fairly uniform deposit from 5-45Amps/ft 2 (0.5-4.5Amp/dm 2).Optimum Composition for an Agitated Solution - Semi-bright f

50、rom 3-60 Amps/ft(0.3-6.0 Amp/dm2).Low Overall Concentration - Low cathode efficiency, gassing, semi-bright but thindeposit, depending uponactual concentration.High Overall Concentration -Same as that for“ Optimum Composition”.Low Free CyanideA dull deposit that is not as uniform and smooth as that f

51、rom the“ Optimum Composition”.The solution is slightly blue in color.Slightly High Free Cyanide -Somewhat lower efficiency than that from theComposition ” , but asomewhat brighter deposit.2“ OptimumVery High Free Cyanide > 2 oz/gal (15 g/l) - Low efficiency; burnt deposit at high current density.

52、Low Rochelle Salts - Dull deposit similar to that from low free cyanide, but solution is not blue-colored.High Rochelle Salts - Better, brighter, more uniform deposit appearance than from optimum composition,possibly slightly lower cathode efficiency.Low Carbonate - No effect on cathode; anode polar

53、ization in the plating tank may be noticed.High Carbonate > 8 oz/gal (60 g/l) - Appreciable dulling of deposit Low pH (e.g. 11.0) - Slightly irregular depositsHigh pH (> 13.5) - Poor anode corrosion, rough deposit, inclusion of particles in deposit解释：正常静镀 -0.5-4.5ASD范围内产生平滑均匀的镀层正常搅拌镀 -0.3-6ASD

54、范围内产生半光亮镀层低浓度 -阴极效率低，施放气，半明亮而镀层较薄，这取决于实际浓度。低游离氰-不光亮镀层，不均匀和光滑，镀液略有蓝色轻微较高的游离氰-效率较低，但镀层较光亮。非常高的游离氰->15g/L, 效率低，高区烧。低诺切液 -同低游离氰的状况，但镀液不会发蓝。高诺切液 -更光亮均匀平滑的镀层，可能会轻微降低阴极效率。低碳酸盐 -试片上无影响，可能会影响阳极极化。高碳酸盐 ->60g/L, 消光。低 PH- 轻微的不正常镀层。高 PH->13.5 阳极腐蚀，镀层粗糙，有颗粒。Impurities - Rochelle Copper CyanideLead - May

55、brighten slightly, also may cause dark deposits; concentration as a brightener is very critical.Iron (large amount) - Reduced cathode efficiency; thin deposit.Zinc - Brassy, irregular deposit.Chromium - Poor coverage, no deposit at low current density end of cathode. The condition may be correctedby small additions e.g. 0.01 oz/gal (0.075 g/l) of sodium hydrosulfite