快速退火对样品之影响—以X-ray绕射(XRD)与反射(XRR)分析

1、快速退火對樣品之影響以X-ray繞射(XRD)與反射(XRR)分析CoFeB/MgO/CoFeB結構及介面特性同步輻射加速器應用報告人物理五 陳俊頴 C34931120June 3 2009 in NCKU指導教授黃榮俊教授使用XRD分析晶相、晶格常數使用X-ray reflectivity(XRR)分析介面粗糙度、膜厚使用TEM觀察紋理及、粗糙度退火溫度: 無、300 C 、400C、 475C、 500C、 600CMgO5nm5nm5nmMgOCoFeBCoFeBSi subtrate膜厚、電子雲密度、粗糙度Program : Parrat32方法:利用實驗之reflectivity參數

2、及Buk電子雲密度與成長膜厚模擬結果fittingelectronic density of bulk : XRR、XRD所用光束線使用BL17B1工作站8-Circle Diffractometer in BL17B1 HutchOptical layout of BL17BTechnical Information Technical information of BL17BOperational (general use)Yes (since January, 1999) %Time available (general use)75%ExperimentsX-ray Scatterin

3、g/Diffraction (X-ray reflectivity and GIXD)Source25 Poles, 20 cm Period Length Wiggler (W20)Ring Current(mA)300 mAAverage Beam LifetimeInfinite Under NSRRC Top-Up ConditionsEnergy Range4.8 14.2 keV Energy Resolution2.2 x 10E(-4)Spot SizeFWHM: 0.6 mm (H) x 0.5 mm (V)OpticsVertically Collimating Pre-m

4、irror, Fixed-Exit Double Crystal Si(111) Monochromator, Toroidal Focusing Mirror Flux2 x 10E(11)Flux DetailedTotal Flux Measured 8 keVWavelength Min ()0.87Wavelength Max ()2.5MonochromatorWater-Cooled, Fixed-Exit Double Crystal MonochromatorCrystal TypeSi(111)MirrorsRh CoatedMirror Cutoff14.2 keVDet

5、ectorScintillation counterGoniometerHuber 8-circle DiffractometerBiohazardContact in AdvanceSoftwarespec Control SoftwareHardwareTwo PCs Running Linux and Windows參考文獻NSRRC Experimental Facility DivisionBL17B3 Small-Angle X-ray Scattering for BL17B3 Small-Angle X-ray Scattering for NanostructuresNanostructuresS. S. P. Parkin, C. Kaiser, A. Panchula, P. M. Rice, B. Hughes, M. Samant and S. H.Yang, Nature Materials 3, 862 (2004).3, 862 (2004).S. Ikeda, J. Hayakawa, Y. Ashizawa, Y. M. Lee, K. Miura, H. Hasegawa, M. Tsunoda, F. M