原子力显微镜课件

1、原子力显微镜原子力显微镜WAXScrystallization, phase identification;orientaion behavior;crystallagraphic parameters.SAXSmorphology parameters; supermolecular structure;phase sepration behaviors.graying incidence X-ray diffraction, GIDorder phenomena, surface structure characterization;orientation behavior near th

2、e surface.XR or NRsurface or interface roughness;thickness of thin layers or in layer systems;density profiles relating electron or scattering lenghts of neutrons; NR is a near surface (100A) depth profiling technique with outstanding spatial resolution, ca. 0.5ASANSchain conformationlow energy fowa

3、rd recoil spectrometry, LE-FRESto determine the concentration profile of light dements both hydorgen and dentrium in a polymer blend with a resolution as samll as 80ARutherford backscattering, RBSis used to determine the concentration profile of heavy elements in a sampleellipsometryprovides a quick

4、 and easy measurment of films thicknessWAXScrystallization, phase ideLocal method (real room)topograph of the samples (height information)height about th sample surface (laterial length scales, surface roughtness)AFM range 1-100 mOM range 120 - 1500 mOptical Phase Interference Microscopy (OPIM) rang

5、e 50 mScttering method (reciprocal room)Statistical information about the sampleS pecular reflectivity (X-ray, neutron) information perpendicular to the sample surface (thickness, surface roughness, density profile, chemical contrast for neutron)2. diffuse x-ray / neutron scattering grazing incidenc

6、e SAXS grazing incidence SANS information about a possible most prominent in-plane length scaleLocal method (real room)S 纳米测量技术一, 超薄层面及横向纳米结构分析二,电子与电子束分析技术 (1)AES 和XPS (2)能量扩展X射线分析(EDX)三, 质谱分析技术 (1)SIMS/SNMS (2)激光显微质谱分析法-LAMMA四, 显微分析技术 (1)电子显微技术 (2)低能电子与离子投影显微技术 (3)电子全息摄影术 (4)X射线显微技术纳米测量技术一, 超薄层面及横向

7、纳米结构分析二,电子与电子五,扫描探针技术 (1)STM (2)AFM (3)NOSM (4)其他:如热能与光热扫描显微技术,磁力显微技术, 近场声波扫描技术,元件扫描技术等六,纳米表面的测量技术 (1)机械法:如电子笔测量表面粗糙度技术 (2)干涉法:如 Normarski示差干涉衬度显微技术(DIC), 相位干涉测量仪等 (3)其他表面分析技术: 如ellipsometry, SERS, ESR, NMR, IR质谱仪五,扫描探针技术六,纳米表面的测量技术Characterization of the surface of thin filmThickness:Optical interf

8、erometerX-ray interferometerScratch probeChemical composition:RBSSIMSXPSStructure:X-ray scatteringLEEDGIXSTEMAtom covalent:EELS扩展X射线IR and Raman Characterization of the surfacMain spectroscopes used in the structure characterizationAES (俄歇电子能谱) Electron in and out;RBS(卢瑟福散射) Ion in and out;XRF(X射线荧光

9、光谱) X-ray in and out;XPS(X射线光电子能谱) X-ray in, electron out;EMA(电子探针分析) Electron in and X-ray out;SIMS(二次离子质谱) ion in and target ion out;Main spectroscopes used in theAP FIM1A1 nm101001um10100101 um1nm1um1mm1 nm10SIMSLMMSISSXPSTXRFSEM/AESAEMEDSEELSSEM/EPMAEDS/WDSX-rayNSOMPIXENDPPGNPUV/V-FMuRSFTIRXRFXR

10、DRBS1 mm100101001 mm101001010010Lateral Spatial ResolutionAP FIM 原子探针场离子显微镜LMMS激光微探针质谱ISS离子散射谱TXRF全翻射X-射线荧光谱AEM分析电子显微镜EELS电子能量损失谱SEM/EPMA电子探针X射线微区分析NDP中子深度PGNP快速gama中子探针PIXEUV/VFM紫外/可见荧光显微镜uRS微喇曼谱AP FIM1A1 nm101001um10100101 uWhat is Scanning Probe Microscopy?Scanning Probe Microscope (SPM) was inve

11、nted in 1981 by G.Binning and H.Rohrer and in the early 1980s it dazzled the world with the first real-space images of the surface of silicon. Now, SPMs are used in a wide variety of disciplines, including fundamental surface science, routine surface roughness analysis, and spectacular three-dimensi

12、onal imaging-from atoms of silicon to micro-sized protrusions on the surface of a living cell.So, scanning probe microscope (SPM) is a device that enables investigation of various surfaces with high resolution from micrometers down to atomic scale.Three basic SPM techniques are classified by the typ

13、e of probe used: scanning tunneling microscopy (STM), scanning force microscopy (SFM), scanning near field optical microscopy (SNOM).What is Scanning Probe Microsc原子力显微镜原子力显微镜SFM最基本的三种操作模式1, 接触式(contact mode)特点:针尖始终同样品接触并简单地在表面上滑动,相互之间表现为非常弱的库仑排斥力;问题: 虽然可以产生稳定,分辨率高的图像,但有时,特别是测试低模量样品时会带来一些严重问题. 诸如对针尖

14、和样品的损害或者图像中的假象等.SFM最基本的三种操作模式1, 接触式(contact mo2, 非接触模式(non-contact mode)控制探针始终在样品上方5-20 nm处扫描并且始终不和样品表面接触,因而针尖不会对样品造成污染和产生破坏,避免了接触模式中遇到的一些问题.问题:在实际测试过程中,针尖容易被表面吸附气体的表面压吸附到样品表面,造成图像数据不稳定和对样品的破坏.该模式在实际使用过程中控制比较困难,分辨率较低,而且不适合在液体中成像.2, 非接触模式(non-contact mode)3.轻敲模式(tapping mode)该模式避免了针尖沾附样品以及在扫描过程中对样品的破

15、坏.针尖在接触样品时有足够的振幅来克服针尖和样品间的粘附力.同时作用力是垂直的,材料表面受横向摩擦力,压缩力和剪切力影响较小. 另外其垂直反馈系统高度稳定,重复测试精度高.克服了与摩擦,粘附, 静电力等有关的问题,对软,粘性或者易脆表面的测试至关重要.迄今为止, 无论在空气或者液体环境中,对硅表面,膜,金属和绝缘体,感光树脂,高聚物和生物等的测试中发挥了极大的作用.3.轻敲模式(tapping mode)4,摩擦力显微镜(LFM)和化学力显微镜(CFM)适用于研究那些形貌上相对较难区分,而又具有相对不同摩擦和化学特性的多组份材料表面.可以识别聚合混合物(blend)和复合物(composite

16、),鉴别表面有机和其他污染物以及研究表面修饰层和表面覆盖程度.在半导体,高聚物沉积膜,数据储存器,以及对表面污染,化学组成和摩擦特性的观察研究等方面有极其重要的作用.5. 磁力显微镜(MFM)和静电力显微镜(EFM)MFM主要用于研究磁记录体系,磁性薄膜磁酬结构和铁磁学等基本现象等.具有高分辨率,不破坏样品和样品无需特别置备等特点.EFM同MFM类似,主要应用于半导体器件的分析和设计研究领域中.4,摩擦力显微镜(LFM)和化学力显微镜(CFM)5. 磁力特殊SFM技术力调制(force modulation)技术是研究表面上不同硬度和弹性区域的SFM技术.用于测定混合物中的转变,测定聚合物的均

17、匀性,对硬基底上有机材料的成像,检测IC上的剩余感光树脂和验明不同材料的污染情况.适用于表面特征差的材料进行表面弹性的观测研究.在聚合物,半导体,材料组成和其他领域有着巨大的应用前景.相位成像(phase imaging)技术通过轻敲模式扫描过程中振动微悬臂的相位变化来检测表面组分,粘附性,摩擦,粘弹性和其他性质的变化.与轻敲模式一样快速,简便,并具有对柔软,粘附,易损伤或者松散结合样品进行成像的特点.特殊SFM技术力调制(force modulation)技术成像环境Vacuum扫描力显微镜SFM显微原理显微技术AFMFFMCFMMFMEFM成像模式ContactNoncontactTapp

18、ingAirSolventBuffer solutionWater相关技术Force-sepration curvesForce modulationForce imaging成像环境Vacuum扫描力显微镜SFM显微原理显微技术AFM原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜AFM技术的主要特点:优点:制样相对简单,多数情况下对样品 不破坏.可同时得到尽可能多的信息.操作简单,对附属设备要求低, 价格相对较低.可进行特殊样品(如溶液状态下)的测试.缺点:对试样仍有较高要求,特别是平整度.实验结果对针尖有较高的依赖性(针尖效应).仍然属于表面表征技术,需和其他测试手段结合.A

19、FM技术的主要特点:优点:缺点:Current producer of the AFM devices:US: Veeco Corp. (Digital Image, Park Sci. and Topomerix); Molecular Image, -Russia: NMT;Japan: Seiko, Jeol, Shimizu;GER: Omicron; -U.K.: Oxford Sci.; -Israel: Nanonicx;Spanish: -Denmark: -China, PR: -Current producer of the AFM de原子力显微镜原子力显微镜原子力显微镜

20、原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜图3-17 重组菌株XBU001的AFM观察Fig.3-17 Atomic Force Microscopy of XBU001A、B、不同扫描范围的无晶体突变株XBU001AFM图A , B . AFM of XBU001 strain with different size图3-17 重组菌株XBU001的AFM观察原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原

21、子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜原子力显微镜Crystals of polyethylene on silicon substrateCrystals of polyethylene on siAFM topography (left) and phase (right) images of polyethylene crystals on mica substrate. Phase image shows higher contrast and reveal fine structure details t

22、hatare not detectable by AFM.AFM topography (left) and phasTopography (left) and phase image (right) of polyethylene. The sample was obtained by melt cooling.Topography (left) and phase imLamellar structure of the polypropylene spherulite. Left image is topography; right image is amplitude signal.Lamellar structure of the polyDendrite lying on spherulites of block-copolymer poly(buthyleneterephtalate)-poly(tetramethyleneoxide). Left - topography image; right - phase image.Dendrite lying o